Applications
- Super high resolution HAADF/LAADF/ABF/BF-STEM imaging
- High resolution iDPC imaging for light elements
- DPC and Lorentz microscopy for magnetic and polarized materials
- Fast EDS elemental mapping with Dual-X
- Fast EELS mapping and EFTEM with Gatan K3 direct detection camera
- High energy resolution monochromated EELS
- 4D-STEM for strain/phase/orientation/field mapping, DPC, and ptychography
Contact
Location
Microscope Room: G032; Control Room: G030
Acknowledgments
Publications, presentations, and posters resulting from work on this instrument should state: “The authors acknowledge the financial support of the University of Michigan College of Engineering and technical support from the Michigan Center for Materials Characterization.”
Specifications
- Accelerating Voltage
- 30, 60, and 300kV
- Electron Source
- X-FEG high-brightness Schottky type field emission gun
- Illumination system
- Three-lens condenser system with adjustable convergence angles
- ConstantPowerTM design allowing for fast switching of modes, magnification, conditions, and techniques, with minimized stabilization time
- Monochromator
- In-column Wien-fielter type monochromator enabling high-resolution EELS with < 0.2 eV energy resolution at 300 kV and ≤ 25 meV at 30 kV with UltiMono
- OptiMono+ software package providing automated monochromator tuning
- Aberration corrector
- Cs S-CORR Probe Corrector optimizes higher order aberrations up to 5th order (C5 & A5), allowing for improved spatial resolution at low kV
- Image Acquisition & Analysis System
- Ceta-S bottom mount CMOS camera with up to 4k × 4k resolution
- Ceta speed enhancement (40 fps at 4k × 4k and 300 fps at 512 × 512)
- Simultaneous STEM HAADF/DF-S/DF-O/DF-I/BF-S acquisition with Panther STEM detection system
- Segmented detector for DPC imaging with live iDPC and dDPC
- EMPAD for 4D-STEM with a speed up to 1100 fps
- Resolution
- CTEM point resolution 0.21 nm; information limit <0.10 nm (300 kV)
- STEM ≤ 0.06 nm at 300 kV; ≤ 0.111 nm at 60 kV; ≤ 0.136 nm at 30 kV
- EDS
- Dual-X window-less detector consists of 2 × 100 mm2 racetrack SDDs with a solid angle of 1.8 srad, detecting all elements down to and including boron
- EELS System
- Gatan Continuum K3 HR/1069HR (300 kV) with FXUP (30 & 60 kV) post-column energy filter with ultra-fast electrostatic shutter, high-speed DualEELS, and BF/DF detector
- Lorentz microscopy
- Built-in Lorentz lens in the lower pole piece of the objective lens enables to image magnetic structures
- In-situ observation under controllable magnetic field along the optical axis
- Precession Diffraction
- Beam precession up to 3° with real-time descan below the specimen for acquiring electron diffraction patterns in TEM mode with minimized dynamical diffraction effect
- Compatible sample holders
- CompuStage single-tilt (x = ±35°) holder
- High-visibility low-background double-tilt (x = ±35°, y = ±30°) holder for optimized EDS acquisition
- Fischione Tomography holder Model 2020 with high-tilt angles (x = ±70°)
- Gatan Elsa cryo-transfer holder allows >9 h below -145 °C and >8 h of stable, high-resolution imaging with high-tilt capability (x = ±70°)
- Protochips Fusion Select double-tilt (x = ±30°, y = ±18°) MEMS-based heating and biasing holder
- Other Accessories
- Velox software for TEM/STEM/DPC imaging with simultaneous EDS and EELS acquisition
- OptiSTEM+ for automated, reliable, fast, and robust correction of first and second order aberrations (C1/A1/A2/B2) on real samples
- TEM scripting for controlling the microscopy by a user application