FEI Tecnai G2 F30 TWIN TEM

  • The microscope is interfaced with a particle accelerator and a low energy ion source. 
  • Two separate ion species can be mixed and delivered to the TEM stage for in-situ irradiation experiments.

Kai Sun

The TEM is located in the Michigan Ion Beam Laboratory (MIBL) in the North Campus. See MIBL’s webpage for full detail about the particle accelerator and experimental capabilities.

FEI Tecnai G2 F30
TEM Location in MIBL (Click to Enlarge)

Acknowledgments

Publications, presentations, and posters resulting from work on this instrument should state: “The authors acknowledge the financial support of the University of Michigan College of Engineering and NSF grant #DMR-9871177, and technical support from the Michigan Center for Materials Characterization.

Specifications

  • Accelerating Voltage 300 kV 
  • Filament: Zirconated Tungsten thermal emission tip
  • Gun vacuum: < 5.0 x 10-7 Pa 
  • Column vacuum  < 2.0 x 10-5 Pa
  • Resolution CTEM : 0.24 nm point-to-point
  • Resolution STEM : 0.24 nm point-to-point
  • XEDS System: EDAX SDD X-ray detector (active area 30 mm2) for elements with Z>5
  • Gatan camera 2kx2k for 300 kV
  • FEI TIA and Gatan Digital Micrograph
  • High Angle Annual Dark-field detector
  • EDAX TEAM software
  • FEI Low-background Double-tilt Holder (+/- 70 deg.)
  • DENS MEMS heating holder
  • Remote operation capability
  • In-situ ion irradiation

Beamlines Connected to the Microscope

The particle accelerator interfaced with the TEM is the 400 keV ion implanter , built by National Electrostatics Corporation (NEC) and equipped with a Danfyzik Model 921 ion source. This is a single ended accelerator, that can provide ions through beamline 6 (BL6) in the 20 keV – 400 keV, single charge state, and .8, 1.2 and 1.6 MeV (2+, 3+ and 4+ respectively) for multiple ionized states of certain ions. The accelerator can deliver specific ion species, such as Kr, Xe and others as required by the users. The ion source installed on a separate beamline (BL8), is an Alphatross ion source also manufactured by NEC and capable of delivering H and He ions in the energy range of 5-30 keV.

The beamline delivery system consists of sophisticated beam tuning devices capable of sending ion beams to the TEM with wide range of fluences and sizes as required by the users. A state of the art remote control system allows these beams to be delivered form the Control Room located away from the instruments.

BL6 from Implanter
BL8 from Ion Source